| 摘要 |
PURPOSE: A liquid crystal display device and a method for fabricating the same are provided to form an ohmic contact layer on an active layer by n+ doping by using source/drain electrode forming masks and a negative photoresist, thereby preventing the over-etching of the active layer and realizing the uniform thickness of the active layer. CONSTITUTION: A liquid crystal display device includes gate electrodes and gate lines formed on a substrate, a gate insulating film(302) formed on the entire gate lines, an active layer(303) formed on the gate insulating film, an ohmic contact layer(304) formed by n+ ion-doping on the active layer, data lines perpendicular to the gate lines, source and drain electrodes formed at both sides on the ohmic contact layer, a protecting film formed on the source and drain electrodes with contact holes, and pixel electrodes formed in pixel areas to be connected to the drain electrodes via the contact holes. The data lines and the source and drain electrodes are formed simultaneously. The ohmic contact layer is formed by the n+ ion-doping after doping a negative photoresist(320) on the active layer and mounting a third mask for patterning the source/drain electrodes.
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