| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for processing a substrate capable of preventing unevenness of processing of the substrate. <P>SOLUTION: In the apparatus for processing the substrate, the substrate W is held at its periphery by a plurality of holding members 80, and the substrate W is rotated and processed. The holding members 80 abut against the different locations of the periphery of the substrate W, according to the rotating direction CW, CCW of the substrate W. <P>COPYRIGHT: (C)2003,JPO</p> |
