| 摘要 |
PURPOSE: A gas supply unit for semiconductor equipment is provided to perform a wet cleaning process for a process chamber by forming a gas supply member with a flexible pipe. CONSTITUTION: A gas supply unit includes a gas storage tank(10), a process chamber(20), and a gas supply member(30). The gas storage tank is used for storing process gases used for a fabrication process and supplying selectively the process gases by an electronic control operation. The process chamber is used for processing a wafer by using the process gases induced from the gas storage tank. Both ends of the gas supply member are connected to the gas storage tank and a cover(21) of the process chamber, respectively. The gas supply member is a flexible pipe which is formed with stainless alloy. The gas supply member, the gas storage tank, and the process chamber are formed with one body.
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