发明名称 ORGANIC EL PROTECTION FILM USING PLASMA CVD
摘要 <P>PROBLEM TO BE SOLVED: To prevent moisture and oxygen from entering from the outside by forming a polymer, silicon-oxynitride, and silicon-nitride on the protection film of an organic EL substrate. <P>SOLUTION: A polymer 10 is firstly formed by plasma CVD on the top face of the cathode 9 of the organic EL substrate in the low pressure vacuum container, and then, silicon-oxynitride and silicon-nitride 11 are formed on top of it. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003187959(A) 申请公布日期 2003.07.04
申请号 JP20010380053 申请日期 2001.12.13
申请人 SERUBAKKU:KK 发明人 MATSUBARA KAZUO
分类号 H05B33/04;H01L51/50;H01L51/52 主分类号 H05B33/04
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