GAS INJECTOR NOZZLE FOR VACUUM DEPOSITION EQUIPMENT

摘要

PURPOSE: A gas injector nozzle for vacuum deposition equipment is provided to deposit a uniform layer on an upper surface of a semiconductor substrate by changing the number and the size of apertures, of the gas injector nozzle. CONSTITUTION: A gas injector nozzle is installed at an upper portion of a center of a semiconductor substrate in order to inject a supply gas into the vacuum deposition equipment. The gas injector nozzle includes the first screw thread(210) and a gas flow path change member. The first screw thread is formed on an inner circumference of an end portion(200) of the gas injector nozzle. The gas flow path change member includes the second screw thread(220) and a removed incision portion for forming two divided insertion portions(230). The removed incision portion has a shape of symmetrical circle.