ELECTROSTATIC CHUCK

摘要

PURPOSE: An electrostatic chuck is provided to prevent the thermal expansion of a wafer and reduce the generation of particles by using a silicon rubber. CONSTITUTION: An electrostatic chuck includes a main body(10), a base coating portion(20), an electrode portion(30), an over-coating portion(40), and a wafer chucking portion(50). The main body is installed in the inside of a process chamber. The main body is formed with a graphite material. The base coating portion is formed with PBN(Pyrolytic Boron Nitride) in order to cover an outer surface of the main body. The electrode portion is formed by depositing and patterning PG(Pyrolytic Graphite) on a surface of an upper side of the base coating portion. The over coating portion is formed by depositing the PBN on a lower portion of the electrode portion and an outer surface of the base coating portion. The wafer chucking portion is adhered on an upper portion of the patterned electrode portion.