| 摘要 |
PURPOSE: A method for fabricating a metal line is provided to simplify a fabrication process of the metal line by patterning an anti-reflective layer and a metal layer within a single chamber. CONSTITUTION: An oxide layer(14), a conductive layer(13), an anti-reflective layer(12), and a photoresist layer(11) are sequentially stacked on a substrate. The conductive layer is formed with a material. A pattern corresponding to a desired metal line is formed by removing selectively the photoresist layer. The anti-reflective layer except for a photoresist layer region is etched by performing a lithography process using CL2/BC13 gases. The photoresist layer and the anti-reflective layer are removed therefrom. A ratio of CL2/BC13 gases is 0.5 to 2. The anti-reflective layer and the conductive layer are etched within the same chamber.
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