APPARATUS FOR CLEANING BACK SIDE OF WAFER

摘要

PURPOSE: An apparatus for cleaning the back side of a wafer is provided to be capable of preventing particles existing at the back side of the wafer from contaminating an active region of the wafer by previously removing the particles using a shower part. CONSTITUTION: An apparatus for cleaning the back side of a wafer is provided with a cleaning bath(21) for cleaning a plurality of wafers(27), a wafer support part installed in the cleaning bath for supporting and loading the wafers, a shower part(23) installed at the upper portion of the cleaning bath for jetting the predetermined volume of a cleaning solution onto the back sides of the wafers at a predetermined tilt, and an exhaust port(25) installed at the bottom portion of the cleaning bath for exhausting the cleaning solution after carrying out a cleaning process.