METHOD FOR FABRICATING PLANAR WAVEGUIDE

摘要

PURPOSE: A method for fabricating a planar waveguide is provided, which improves productivity and also reduces production costs by omitting a process of forming a top buffer layer. CONSTITUTION: A buffer layer(202) and a mask layer are formed in sequence on a planar substrate(201). A photoresist is deposited on the mask layer, and a photoresist pattern is formed by proceeding a photo lithography and developing process. After patterning a revealed mask layer in the bottom using the photoresist pattern as an etching mask and then the remained photoresist pattern is removed. After forming a waveguide(205) on an etched part by etching the revealed buffer layer in the bottom using the patterned mask layer as an etching mask, the remained mask layer is removed. Then, a core layer(206) is deposited on the buffer layer.