发明名称 |
IMAGE SENSOR FOR IMPROVING PHOTO SENSITIVITY AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: An image sensor and a method for manufacturing the same are provided to be capable of improving photo sensitivity by increasing the area of a photodiode in a pixel unit. CONSTITUTION: A plurality of channel stop regions(CST) is formed in a semiconductor layer. The first impurity region(n1-) is formed in the semiconductor layer located between the channel stop regions(CST). A gate electrode(Tx) is formed on the semiconductor layer located between the channel stop regions(CST). The second impurity region(n2-) is formed on the first impurity region(n1-) to align between the channel stop region(CST) and the gate electrode(Tx). The third impurity region(p0) is formed on the second impurity region(n2-).
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申请公布号 |
KR20030056069(A) |
申请公布日期 |
2003.07.04 |
申请号 |
KR20010086228 |
申请日期 |
2001.12.27 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
HWANG, JUN |
分类号 |
H01L27/146;(IPC1-7):H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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