发明名称 IMAGE SENSOR FOR IMPROVING PHOTO SENSITIVITY AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: An image sensor and a method for manufacturing the same are provided to be capable of improving photo sensitivity by increasing the area of a photodiode in a pixel unit. CONSTITUTION: A plurality of channel stop regions(CST) is formed in a semiconductor layer. The first impurity region(n1-) is formed in the semiconductor layer located between the channel stop regions(CST). A gate electrode(Tx) is formed on the semiconductor layer located between the channel stop regions(CST). The second impurity region(n2-) is formed on the first impurity region(n1-) to align between the channel stop region(CST) and the gate electrode(Tx). The third impurity region(p0) is formed on the second impurity region(n2-).
申请公布号 KR20030056069(A) 申请公布日期 2003.07.04
申请号 KR20010086228 申请日期 2001.12.27
申请人 HYNIX SEMICONDUCTOR INC. 发明人 HWANG, JUN
分类号 H01L27/146;(IPC1-7):H01L27/146 主分类号 H01L27/146
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