| 摘要 |
PROBLEM TO BE SOLVED: To enhance the quality and yield of product by providing a method for developing the end of a substrate in which an unnecessary thick coating film is thoroughly dissolved and removed from the end and the four corners of the substrate where the film is apt to be left, and to enhance work efficiency by eliminating a step for removing the remaining film. SOLUTION: In the method for developing the end of a substrate, the end of a substrate, on which a coating film to be developed is formed, is inserted into a jig having a U-shaped cross-section storing developer, and immersed into the developer for a specified time in order to dissolve and remove an unnecessary thick coating film formed at the end of the substrate. The unnecessary thick coating film formed at the end and the four corners of the substrate immersed into the developer in the jig is dissolved selectively and removed using a pair of jigs having U-shaped cross-sections provided with a protrusion at one end thereof to form an L-shape. COPYRIGHT: (C)2003,JPO |
