| 摘要 |
PURPOSE: A CVD apparatus having a thermal emission plate is provided to circulate smoothly the air supplied from a lower end portion of a boat and form a uniform layer on a wafer by forming uniformly a plurality of holes on the radiation fin. CONSTITUTION: A CVD apparatus(200) includes a flange(180), a boat(150), a plurality of radiation fins(190), a reaction tube(110), a heating source, and a gas inlet and outlet tube(130,140). The boat is installed in the inside of the flange to load plural wafers. The radiation fins are installed at a lower end portion of the boat. The reaction tube is installed at the flange to surround the boat. The heating source is arranged at the outside of the reaction tube in order to heat the reaction tube. The gas inlet tube is installed at the flange in order to supply or exhaust the reaction gas into the reaction tube. A plurality of holes(192) are formed on the radiation fins in a constant interval. The radiation fins are formed with quartz.
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