发明名称 ELECTRON BEAM DRAWER
摘要 PROBLEM TO BE SOLVED: To prevent degradation in positional precision and line-width precision caused by the temperature fluctuation of a sample stage. SOLUTION: The relationship between the temperature fluctuation of a sample stage 106 of an electron beam drawer and the positional deviation amount of a sample 105 is acquired as data, which is stored in a storage means of a correction amount calculator 110. At pattern drawing, the positional deviation amount of a sample is acquired from the pre-stored data based on the temperature fluctuation of the sample stage, and the positional deviation amount is corrected by a deflection control system 115 or a laser measurement system 109, and an electron lens control system 117. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003188075(A) 申请公布日期 2003.07.04
申请号 JP20010385910 申请日期 2001.12.19
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIMADA HAJIME
分类号 G03F7/20;H01J37/20;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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