| 摘要 |
Disclosed is a method of fabricating a liquid crystal display device enabling to form a uniform gate insulating layer in thickness. The present includes the steps of forming a gate line, a gate electrode, and a storage line on a substrate and forming a gate insulating layer on the substrate including the gate line and the gate electrode using first and second gases having a gas mixture ratio of 0.3~0.5:1. And, the first and second gases are mono-silane(SiH4) and ammonia(NH3), respectively. Accordingly, the present invention enables a uniformly thick gate insulating layer, thereby to improving the discharging time as well as reducing flicker on the screen.
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