| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which attains alignment with high precision. SOLUTION: When a base plate 4 is turned byθ°and -θ°before alignment, the relative coordinates of a mask mark 30 and a base plate mark 40 are obtained. From the relative coordinates, the coordinate of the mask mark 30 against the coordinate axis 90 of the exposure device is obtained. Based upon the coordinate, the alignment is carried out. COPYRIGHT: (C)2003,JPO
|
