发明名称 Heat-developable photosensitive material and method of porducing the same
摘要 The present invention provides a heat-developable photosensitive material comprising a support; an undercoat layer disposed on the support and formed in an atmosphere having a cleanliness class of no more than M5.45; and a photosensitive layer including silver behenate as a non-photosensitive organic silver salt and disposed on the undercoat layer, and a method of producing a heat-developable photosensitive material comprising the steps of: forming an undercoat layer by applying a coating liquid for the undercoat layer to a support and drying the liquid; forming a photosensitive layer by applying a coating liquid for the photosensitive layer, which coating liquid includes silver behenate, and drying the liquid; wherein the undercoat layer is formed in an atmosphere having a cleanliness class of no more than M5.45.
申请公布号 US2003124472(A1) 申请公布日期 2003.07.03
申请号 US20020254868 申请日期 2002.09.26
申请人 HIGASHI SOICHIRO 发明人 HIGASHI SOICHIRO
分类号 G03C1/76;B05D1/38;B05D3/02;G03C1/498;G03C1/74;(IPC1-7):G03C1/91 主分类号 G03C1/76
代理机构 代理人
主权项
地址