发明名称 METHOD FOR MANUFACTURING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate, which prevents formation of a plated layer on a needless part, and can form a fine pattern, namely a clearer pattern of a circuit. SOLUTION: This method for manufacturing the substrate comprises the first step of forming insulative protection coating films 14 and 15, on both the surfaces of a substrate body of the substrate 13 which has metal layers 11 and 12 on both the entire surfaces of an insulative substrate 10, the second step of forming an open hole 16 of a through hole at a predetermined position of the substrate body of the substrate 13 on which the insulative protection coating films 14 and 15 have been formed, the third step of electrolytically plating the inside of the open hole 16 after forming a conductive film 21 in the open hole 16, and the fourth step of peeling the insulative protection coating films 14 and 15. The above conductive film 21 may be formed, for instance, by an electrostatic spray coating which uses negatively charged fine particles of carbon, or by electroless plating. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003183876(A) 申请公布日期 2003.07.03
申请号 JP20010386111 申请日期 2001.12.19
申请人 MITSUI HIGH TEC INC 发明人 NAGAI AKIRA
分类号 C25D5/02;C25D5/56;C25D7/00;H05K3/40;H05K3/42;(IPC1-7):C25D5/02 主分类号 C25D5/02
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