| 摘要 |
PROBLEM TO BE SOLVED: To provide an epoxy resin composition excellent in photo-setting by activation radiation, and excellent in water resistance, heat resistance, toughness, adherence and chemical resistance. SOLUTION: A catalyst is added to an epoxy compound represented by general formula 1 to subject the epoxy compound to undergo self-polymerization, giving an oligomer-containing epoxy compound having a cyclohexane ring, with a viscosity at 25°C of 10,000 to 800,000 mPas. A cationic photopolymerization initiator is added to the epoxy resin obtained by this method which is irradiated with actinic radiation to effect photo-setting. COPYRIGHT: (C)2003,JPO
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