Exposure method and apparatus for producing a hologram mask and recording method using the hologram mask

摘要

In a second exposure following a first exposure, a light transmitting-screening pattern of a second original mask is exposed on a hologram material by using a second object light to be irradiated on a hologram material though the second original mask and a second reference light to be irradiated on a hologram material to be irradiated on the hologram material not through the second original mask, and by changing a second phase difference between the second object light and the second reference light in a position in an optical path from a light source to the hologram material so that a first phase difference between the first object light and the first reference light may differ from the second phase difference.