Abbildungseinrichtung in einer Projektionsbelichtungsanlage

摘要

Disclosed is an imaging device (7) in a projection exposure facility (1) used in microlithography, comprising at least one optical element (10, 33, 34) and at least one manipulator (9, 36, 41) provided with a linear drive (11) for manipulating the position of the optical element (10, 33, 34). The linear drive (11) encompasses a driven section (14) and a non-driven section (15) which are movable towards each other along an axis (17). The two sections (14, 15) are at least temporarily connected to each other at least approximately parallel to the axis of movement (17) via functional elements (18) operable along an axis (17) and via functional elements (19) operable in one direction.