| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
An off-axis alignment system in a lithographic projection apparatus uses broadband radiation to illuminate a phase grating on the wafer. The broadband radiation source may include fluorescent materials, e.g. Yag:Ce or ND:Yag crystals illuminated by excitation light.
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| 申请公布号 |
US2003123035(A1) |
申请公布日期 |
2003.07.03 |
| 申请号 |
US20020273352 |
申请日期 |
2002.10.18 |
| 申请人 |
NEIJZEN JACOBUS HERMANUS MARIA;MONSHOUWER RENE |
发明人 |
NEIJZEN JACOBUS HERMANUS MARIA;MONSHOUWER RENE |
| 分类号 |
G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/42 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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