发明名称 |
GAS PURGING METHOD AND EXPOSURE SYSTEM, AND DEVICE PRODUCTION METHOD |
摘要 |
When gas-purging a space between a specific object (RST or R) disposed on the optical path of light (EL) having a specified wavelength and an optical device (ILU), a shielding member (22) for shielding from outside air a space (IM) between the optical device and the specific object is disposed with a specified clearance kept formed with respect to the specific object, and a specific gas lower in absorption characteristics with respect to the light than an absorbing gas is supplied to the space (IM) via an air supply pipe (60) connected to the shielding member. An inner gas in the space (IM) is exhausted to the outside via an exhaust pipe (61) connected to the shielding member. Accordingly, the use of a small shielding member capable covering a space between an optical device and a specific object enables gas substituting almost as accurate as when a large, heavy air-tight shielding vessel is used.
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申请公布号 |
WO03054936(A1) |
申请公布日期 |
2003.07.03 |
申请号 |
WO2002JP13425 |
申请日期 |
2002.12.24 |
申请人 |
NIKON CORPORATION;SHIRAISHI, NAOMASA |
发明人 |
SHIRAISHI, NAOMASA |
分类号 |
G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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