发明名称 |
PLASMA TREATMENT APPARATUS, MATCHING BOX, IMPEDANCE MATCHING DEVICE, AND COUPLER |
摘要 |
A matching box has a contact device insertion unit as an insertion opening for a contact device. When the matching box is fixed to a side external wall of a vacuum vessel, positioning is performed with a spatial margin in the space around a feeding stick. After this, the contact device is inserted into the contact device insertion unit, thereby establishing an electric contact between an external circuit and the feeding stick. Moreover, a socket (40) arranged at the output portion of an impedance matching device has an engagement hole (41) for engaging with and holding the feeding stick (32) in the center of a metal body (40a) formed in a cylindrical shape. On the inner wall of the engagement hole (41), there is provided a film layer (42) made of an insulator, thereby electrically insulating from the feeding stick (32). A high-frequency power generated by a second high-frequency power source (51) is transmitted to the feeding stick (32) by induction coupling.
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申请公布号 |
WO03054940(A1) |
申请公布日期 |
2003.07.03 |
申请号 |
WO2002JP13094 |
申请日期 |
2002.12.13 |
申请人 |
TOKYO ELECTRON LIMITED;HIGASHIURA, TSUTOMU |
发明人 |
HIGASHIURA, TSUTOMU |
分类号 |
C23C16/509;H01J37/32;H01L21/205;H03H7/38;(IPC1-7):H01L21/205;H01L21/306;C23F4/00;H05H1/46 |
主分类号 |
C23C16/509 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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