发明名称 PLASMA TREATMENT APPARATUS, MATCHING BOX, IMPEDANCE MATCHING DEVICE, AND COUPLER
摘要 A matching box has a contact device insertion unit as an insertion opening for a contact device. When the matching box is fixed to a side external wall of a vacuum vessel, positioning is performed with a spatial margin in the space around a feeding stick. After this, the contact device is inserted into the contact device insertion unit, thereby establishing an electric contact between an external circuit and the feeding stick. Moreover, a socket (40) arranged at the output portion of an impedance matching device has an engagement hole (41) for engaging with and holding the feeding stick (32) in the center of a metal body (40a) formed in a cylindrical shape. On the inner wall of the engagement hole (41), there is provided a film layer (42) made of an insulator, thereby electrically insulating from the feeding stick (32). A high-frequency power generated by a second high-frequency power source (51) is transmitted to the feeding stick (32) by induction coupling.
申请公布号 WO03054940(A1) 申请公布日期 2003.07.03
申请号 WO2002JP13094 申请日期 2002.12.13
申请人 TOKYO ELECTRON LIMITED;HIGASHIURA, TSUTOMU 发明人 HIGASHIURA, TSUTOMU
分类号 C23C16/509;H01J37/32;H01L21/205;H03H7/38;(IPC1-7):H01L21/205;H01L21/306;C23F4/00;H05H1/46 主分类号 C23C16/509
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