EXPOSURE DEVICE EQUIPPED WITH FOREIGN MATTER INSPECTING FUNCTION AND FOREIGN MATTER INSPECTING METHOD OF THE SAME DEVICE

摘要

PROBLEM TO BE SOLVED: To inspect whether a foreign matter is present on a pattern surface of a mask and an exposure surface of a substrate to be exposed before the pattern surface and exposure surface are put closer to each other. SOLUTION: The exposure device which performs exposure while putting the pattern surface Ma of the mask M held by a mask holder 1 and the exposure surface Pa of the substrate P to be exposed held by an exposure chuck 2 closer to each other is equipped with a driving means D which drives at least one of the mask holder and exposure chuck so as to relatively move the mask and substrate to be exposed before the pattern surface of the mask and the exposure surface of the substrate to be exposed are put closer to each other and detecting means 6 and 7 which optically detect the state of the pattern surface and the state of the exposure surface when at least one of the mask holder and exposure chuck is driven to relatively move the mask and substrate to be exposed. A control means decides whether or not there is a foreign matter on the pattern surface according to the output of the detecting means corresponding to the pattern surface and also decides whether there is a foreign matter on the exposure surface according to the output of the detecting means corresponding to the exposure surface. COPYRIGHT: (C)2003,JPO