发明名称 ELECTRODE STRUCTURE FOR ELECTRONIC AND OPTO-ELECTRONIC DEVICES
摘要 The present invention discloses an electrode structure for electronic and op to- electronic devices. Such a device comprises a first electrode substantially having a conductive layer (204), a nonmetal layer (206) formed on the conductive layer, a fluorocarbon layer (208) formed on the nonmetal layer, a structure (210) formed on the structure. The electrode may further comprise a buffer layer (205) between the conductive layer and the nonmetal layer.</SDO AB>
申请公布号 CA2470206(A1) 申请公布日期 2003.07.03
申请号 CA20022470206 申请日期 2002.11.26
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 WIDMER, ROLAND W.;GERMANN, ROLAND W.;RUHSTALLER, BEAT;BEIERLEIN, TILMAN A.;CRONE, BRIAN;SEIDLER, PAUL;ALVARADO, SANTOS F.;MUELLER, PETER;KARG, SIEGFRIED F.;RIESS, WALTER;DRECHSLER, UTE;RIEL, HEIKE
分类号 H01L51/50;H01L51/52;H05B33/10;H05B33/22;(IPC1-7):H05B33/22;H01L51/20 主分类号 H01L51/50
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