发明名称 PARTIAL PLATING PROCESS AND ELECTRONIC COMPONENT OBTAINED BY USING THE PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a partial plating process which may greatly improve the reliability of a sealed electronic structure product and realizes a high mountability and sealability/weldability, and an electronic component obtained by using this process. SOLUTION: In the partial plating process, an electric current with a polarity opposite to that of a plating solution is applied to a plate-form metal (II) to perform partial electroless plating of the metal plate (II). Here, the metal plate (II) is positioned on at least one of the principal surfaces of another metal plate (I) via an insulating layer. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003183842(A) 申请公布日期 2003.07.03
申请号 JP20010381382 申请日期 2001.12.14
申请人 HITACHI LTD 发明人 ISHIKAWA NORITOSHI;AKABOSHI HARUO;KAWANOBE HIROAKI;TERAKADO KAZUYOSHI;ONOSE SHIN;KASE MASAMICHI
分类号 C23C18/31;C23C18/36;(IPC1-7):C23C18/31 主分类号 C23C18/31
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