| 摘要 |
A process for making thermally imageable negative working compositions comprising the steps of: (1) providing a patterning composition layer on a substrate, said patterning composition comprising: (a) at least one acid generator which is sensitive to UV radiation; (b) at least one cross-linking resin or compound; (c) at least one binder resin comprising a polymer containing at least one reactive pendent group consisting of hydroxyl, carboxylic acid, sulfonamide, alkoxymethylamide and mixtures thereof; and (d) at least one infrared absorber; (2) subjecting the patterning composition layer to a two-stage radiation exposure; (a) one stage being a flood UV-exposure; and (b) the other stage being a imagewise infrared exposure stage; (3) treating the exposed patterning composition with heat energy; and (4) developing the heat treated, exposed patterning composition with an aqueous alkaline developer to remove the non-imaged areas of the patterning composition and leaving the imaged areas substantially unaffected.
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