发明名称 DISCHARGE PLASMA TREATMENT METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for controlling an exhaust gas flow rate during discharge plasma treatment which provides a constant exhaust gas flow rate in an exhaust pipe, even when the exhaust pipe is blocked up with depositions of unreacted gas. <P>SOLUTION: In a discharge plasma treatment method, a treatment gas is fed between a pair of electrodes, at least one of which has its surface facing the other electrode coated with a solid dielectric, to apply an electric field and generate glow discharge plasma for treating a substrate, and the treated exhaust gas is subsequently recovered. Here, the flow rate in the exhaust pipe is controlled via a control valve positioned between the inlet and the downstream area of the exhaust pipe, based on the differential pressure measured between these areas. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003183832(A) 申请公布日期 2003.07.03
申请号 JP20010387906 申请日期 2001.12.20
申请人 SEKISUI CHEM CO LTD 发明人 YAMAKAWA TATSUSABURO;ONO TSUYOSHI
分类号 H05H1/24;B01J19/08;C23C16/44;H01L21/205 主分类号 H05H1/24
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