发明名称 REFLECTOR FOR VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To improve the corrosion resistance in a hydrochloric acid corrosive atmosphere of a reflector for a vapor deposition apparatus. SOLUTION: The reflector 11 is manufactured by forming an intermediate layer 13 on a parent material 12 made of Cu through Ni plating, and further forming a reflection coating film 14 thereon through Au plating. Here, Cu composing the parent material 12 has a more noble corrosion potential compared to that of Ni composing the intermediate layer 13. The corrosive potentials of these layers become nobler in the order of the intermediate layer, the parent material and the reflection coating film. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003183834(A) 申请公布日期 2003.07.03
申请号 JP20010388184 申请日期 2001.12.20
申请人 TOSHIBA MACH CO LTD 发明人 NISHIBAYASHI MICHIO;NAKAZAWA SEIICHI;MORIYAMA YOSHIKAZU;MARUYAMA KIMITAKA
分类号 C23C16/46;(IPC1-7):C23C16/46 主分类号 C23C16/46
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