发明名称 Integrated passive devices formed by demascene processing
摘要 A passive transmission line element (device) monolithically integrated into an integrated circuit at one or more levels of the integrated circuit by using a damascene process to delineate a conductive line such that at least the bottom surface and sidewalls of the conductive line are embedded in an enhancement layer having high permeability and/or high permitivity. Optionally a second enhancement layer may cover the conductive line, to completely embed or surround the conductive line with permeability and/or permitivity enhancement material. The passive transmission line device comprising the conductive line and the enhancement layer thus has enhanced distributed inductance and/or enhanced distributed capacitance. In addition, the passive transmission line device may optionally have enhanced distributed resistance as well by forming the conductive line from resistive (i.e., not highly conductive) material.
申请公布号 US2003122175(A1) 申请公布日期 2003.07.03
申请号 US20010034596 申请日期 2001.12.28
申请人 BUSKIRK PETER VAN 发明人 BUSKIRK PETER VAN
分类号 H01L21/02;H01L21/768;H01L23/522;H01L23/532;H01L27/08;H01L27/22;(IPC1-7):H01L27/108;H01L29/76;H01L29/94;H01L31/119 主分类号 H01L21/02
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