| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable an ultra-microfabrication exceeding the conventional techniques by using a polymeric material having low absorption in the wavelength region of vacuum ultraviolet radiation (VUV). <P>SOLUTION: In an exposure method in which a resist layer is selectively exposed with UV and patterned in a prescribed shape, a polymeric material having an introduced adamantane group in which two or more hydrogen atoms have been replaced with at least one selected from a fluorine atom, a trifluoromethyl group and a difluoromethylene group is used as a polymeric material forming the resist layer. <P>COPYRIGHT: (C)2003,JPO |
