发明名称 |
METHOD FOR MANUFACTURING SYNTHETIC QUARTZ GLASS FOR OPTICAL USE, SYNTHETIC QUARTZ GLASS FOR OPTICAL USE AND ANNEALING FURNACE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing synthetic quartz glass having less than 0.5 nm/cm birefringence in the direction of light transmittance and good refractive index distribution for optical use without reducing productivity, and to provide the synthetic quartz glass for optical use and an annealing furnace suitable for the manufacturing method. <P>SOLUTION: The temperature of a pillar-shaped preform of synthetic quartz glass for optical use is raised to 800-1,200°C, held for a fixed time, and lowered each at 2-50°C/h but with 1-20°C of the temperature difference between the temperature of the optical transmission surface and the temperature of peripheral side surface of the synthetic quartz glass preform. <P>COPYRIGHT: (C)2003,JPO</p> |
申请公布号 |
JP2003183036(A) |
申请公布日期 |
2003.07.03 |
申请号 |
JP20010384505 |
申请日期 |
2001.12.18 |
申请人 |
SHINETSU QUARTZ PROD CO LTD |
发明人 |
OSHIMA TAKAYUKI;FUJINOKI AKIRA |
分类号 |
G02B1/00;C03B19/14;C03B20/00;C03B32/00;C03C3/06;(IPC1-7):C03B20/00 |
主分类号 |
G02B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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