发明名称 METHOD FOR MANUFACTURING SYNTHETIC QUARTZ GLASS FOR OPTICAL USE, SYNTHETIC QUARTZ GLASS FOR OPTICAL USE AND ANNEALING FURNACE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing synthetic quartz glass having less than 0.5 nm/cm birefringence in the direction of light transmittance and good refractive index distribution for optical use without reducing productivity, and to provide the synthetic quartz glass for optical use and an annealing furnace suitable for the manufacturing method. <P>SOLUTION: The temperature of a pillar-shaped preform of synthetic quartz glass for optical use is raised to 800-1,200°C, held for a fixed time, and lowered each at 2-50°C/h but with 1-20°C of the temperature difference between the temperature of the optical transmission surface and the temperature of peripheral side surface of the synthetic quartz glass preform. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003183036(A) 申请公布日期 2003.07.03
申请号 JP20010384505 申请日期 2001.12.18
申请人 SHINETSU QUARTZ PROD CO LTD 发明人 OSHIMA TAKAYUKI;FUJINOKI AKIRA
分类号 G02B1/00;C03B19/14;C03B20/00;C03B32/00;C03C3/06;(IPC1-7):C03B20/00 主分类号 G02B1/00
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