发明名称 Semiconductor laser element having end-facet protection layer which includes unoxidized or unnitrided first sublayer formed on end facet and second sublayer produced by oxidizing or nitriding the surface of the first sublayer
摘要 A semiconductor laser element includes: a stack of layers having resonator facets; and at least one protection layer formed on at least one of the resonator facets. Each of the at least one protection layer includes at least first, second, and third sublayers. The first sublayer is formed nearest to the stack among the at least first, second, and third sublayers, and made of a material not containing oxygen (or nitrogen) as a constituent element. The second sublayer is made of an oxide (or nitride) produced by oxidizing (or nitriding) a portion of the first sublayer. The third sublayer is formed farthest from the stack among the at least first, second, and third sublayers, and made of an oxide (or nitride). The thickness d2 of the second sublayer and the total thickness d1 of the first and second sublayers satisfy a relationship, 0.1<=d2/d1<=0.9.
申请公布号 US2003123506(A1) 申请公布日期 2003.07.03
申请号 US20020322599 申请日期 2002.12.19
申请人 FUJI PHOTO FILM CO., LTD. 发明人 YAMANAKA FUSAO
分类号 H01S5/028;H01S5/22;H01S5/223;H01S5/343;(IPC1-7):H01S5/00 主分类号 H01S5/028
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