| 摘要 |
The invention concerns a device for etching, rinsing and drying substrates (7), comprising a tank (5) having a diffusing base (9) and an overflow chute (2). Spray nozzles (10, 11) are provided in the diffuser base (9), for injecting, into the tank, an etching liquid (LG) and a rinsing liquid (LR). The tank (5) is equipped in the upper part with at least a ramp (1) for injecting a drying liquid (LS) to form a surface layer of homogeneous thickness above the water constituting the rinsing liquid (LR). The drying liquid (LS) is non-miscible with water and has a surface tension and a density lower than those of water. |
