发明名称 GAS INJECTOR SUITABLE FOR ALD PROCESS
摘要 <p>PURPOSE: A gas injector suitable for ALD(Atomic Layer Deposition) process is provided to supply periodically various kinds of gases by using a chopper instead of an ALD valve or an ALD PLC. CONSTITUTION: A gas injector includes a body(122), a motor(180), and a chopper(124). The body of a cylindrical shape is installed on an upper portion of a reaction chamber. A plurality of gas injection tubes(122a) are formed at a bottom side of the body. A center tube is formed between a top side and the bottom side. A rotary shaft(180a) of the motor is inserted into the center tube. The chopper has a shape of disc and an incised portion. The chopper is connected to an end portion of the rotary shaft. Each injection region of the gas injection tubes is circularly arranged along a circumference of the bottom side of the body. One or more injection regions have different sizes from the remaining injection regions.</p>
申请公布号 KR20030054723(A) 申请公布日期 2003.07.02
申请号 KR20010085118 申请日期 2001.12.26
申请人 JU SUNG ENGNEERING CO., LTD. 发明人 HWANG, CHEOL JU;PARK, JONG MAN
分类号 H01L21/205;C23C16/44;C23C16/455;F23D14/48;F23D99/00;(IPC1-7):H01L21/205 主分类号 H01L21/205
代理机构 代理人
主权项
地址