| 摘要 |
PURPOSE: Ion implantation equipment having an oscillating dispersion supporter is provided to be capable of preventing the deviation of a wafer due to the oscillation generated by the rotating force of a spinner apparatus. CONSTITUTION: A cassette(C) storing a plurality of wafers is capable of moving up and down by using an elevator apparatus(100). A plurality of oscillating dispersion supporters(152,154,156,158) are installed between the elevator apparatus(100) and the surface of the ion implantation equipment. At this time, the oscillating dispersion supporters are capable of dispersing the oscillation generated by the rotation of a spinner apparatus, so that the wafers are capable of holding positions of the cassette without deviation.
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