| 摘要 |
PURPOSE: An exposure apparatus is provided to be capable of increasing the lifetime of lens and improving resolution by preventing contamination of a projection lens due to evaporation of photoresist. CONSTITUTION: An exposure apparatus(20) comprises a light source(21), a condensed lens(22), a mask(23), a projection lens(24), a wafer stage(26), and a wafer chuck. The exposure apparatus(20) further includes a catch cup(30) formed on the wafer stage, a temperature controller(31) formed between the wafer chuck and the wafer stage, and an exhaust system. The catch cup(30) is protected from the evaporation of photoresist when irradiating the light to the photoresist of a wafer(25) via the projection lens(24). The temperature controller(31) is reduced mean free path of the vaporized materials of the photoresist.
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