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发明名称
IN-SITU METHOD AND APPARATUS FOR END POINT DETECTION IN CHEMICAL MECHANICAL POLISHING
摘要
申请公布号
EP1322940(A1)
申请公布日期
2003.07.02
申请号
EP20010957372
申请日期
2001.07.31
申请人
ASML US, INC.;MASSACHUSETTS INSTITUTE OF TECHNOLOGY
发明人
SAKA, NANNAJI;NAM, JAMIE;OH, HILARIO, L.
分类号
G01N21/86;B24B37/04;B24B49/12;G01B11/06;H01L21/304;(IPC1-7):G01N21/86
主分类号
G01N21/86
代理机构
代理人
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