| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus for treating waste gallium-polishing water by which polished scraps of gallium being a particularly rare and valuable metal can be recovered efficiently as a high-concentration solution of several wt.% to several tens wt.% gallium by treating the waste gallium-polishing water discharged from a factory for manufacturing a wafer of a compound semiconductor, a device manufacturing factory or the like. <P>SOLUTION: This apparatus is provided with a solid-liquid separating tank having a port for introducing the waste gallium-polishing water, a solid-liquid separation part arranged in the upper part, a precipitating part arranged in the lower part, a port communicated with the solid-liquid separation part for discharging the treated water and a port communicated with the precipitation part for discharging a precipitate. <P>COPYRIGHT: (C)2003,JPO |
