| 摘要 |
PURPOSE: A depositing method of a chamber is provided to remove alien substances from substrates by blowing and pumping nitrogen gas before depositing the substrates in a deposition chamber. CONSTITUTION: A plurality of substrates are loaded in a deposition chamber(S10). The substrates are heated(S12). A deposition film is formed on the substrates(S14). A gas diffuser blows nitrogen into the deposition chamber to float alien substances(14a). Nitrogen gas is pumped to exhaust the N2 gas with the floated alien substances from the deposition chamber(S14b). The deposition chamber before deposition is stabilized(S14c). A deposition film is formed by exciting plasma(14d). The loaded substrates are separated(S16).
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