| 摘要 |
PURPOSE: A polishing pad dresser for silicon wafer is provided to remove effectively particles from a nap layer of a polishing pad by using the oscillation and the frictional force. CONSTITUTION: A polishing pad dresser(10) for silicon wafer includes a circular plate(12) and a concavo-convex portion(14). The circular plate is in contact with a nap layer of a polishing pad used in a polishing process of a silicon wafer. The concavo-convex portion is continuously formed on one side of the circular plate. Particles are removed from the nap by using the friction force between the concavo-convex portion and the nap layer. The concavo-convex portion has a section including a vertical portion and a slope portion. A plurality of concave portions and a plurality of convex portions are formed in a constant interval on the concavo-convex portion.
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