STRUCTURE OF OVERLAY MARK AND METHOD FOR FORMING THE SAME

摘要

PURPOSE: A structure of an overlay mark and a method for forming the same are provided to be capable of improving the profile of a resist pattern irrespective of the surface curvature of an interlayer dielectric. CONSTITUTION: A structure of an overlay mark comprises the first metal wiring(71) for surrounding the outmost peripheral of the overlay mark, the first resist pattern(74) arranged at center portion of the overlay mark, and the second metal wiring(72) located between the first metal wiring and the first resist pattern. The first metal wiring(71) has a bar shape or a frame shape. The overlay mark further includes the second resist pattern(73) formed between the first metal wiring(71) and the second metal wiring(72).