| 摘要 |
PURPOSE: An automated mask loading apparatus is provided to be capable of obtaining process reproducibility and preventing the failure due to particles. CONSTITUTION: A wafer loading apparatus is provided with a circular-type chuck(10) installed and connected to a chuck support bar for loading a mask(11) and a chuck guide(14) installed and connected with each lateral portion of the loaded mask. The wafer loading apparatus further includes an automated mask loading apparatus. At this time, the automated mask loading apparatus is provided with a plurality of chuck guide shafts(16) installed for supporting the chuck guide, a plurality of springs(13) installed at each lateral portion of the circular-type chuck, and a plurality of chuck connecting bars(12) connected between the spring and the chuck guide shaft for helping the rotation of the chuck guide when the circular-type chuck is moved up and down.
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