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发明名称
半导体发光装置
摘要
一种具有依序地形成在一n型砷化镓(GaAs)基材11上之一下覆盖层12、一主动层13、一p型磷化镓(GaP)层14以及一上覆盖层15之半导体发光装置。该p型磷化镓层14在传导带中的能量比该上覆盖层15高0.10电子伏特(eV),其使得电子从该主动层13脱离更加困难。这导致在该主动层13内的电子和电洞间之辐射性复合(radiativerecombination)的可能性增加,因此,半导体发光装置的亮度被改善。该p型磷化镓层14在一具有一短波长的半导体发光装置中是尤其有效的。
申请公布号
TW200301574
申请公布日期
2003.07.01
申请号
TW091134297
申请日期
2002.11.26
申请人
夏普股份有限公司
发明人
中村 淳一;佐佐木 和明
分类号
H01L33/00
主分类号
H01L33/00
代理机构
代理人
陈长文
主权项
地址
日本
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