| 摘要 |
A semiconductor device includes a p type semiconductor substrate, a first n type region formed at the semiconductor substrate, a first n channel DMOS transistor formed in the first n type region, a second n type region formed at the semiconductor substrate, a vertical type pnp bipolar transistor formed in the second n type region, and a second n channel DMOS transistor formed in the second n type region. The first n channel DMOS transistor has a drain for receiving a high power supply voltage (Vdc) and a source for supplying an output voltage (Vout). The bipolar transistor has a base connected to the gate of the first n channel DMOS transistor, an emitter connected to the source of the first n channel DMOS transistor, and a collector connected to the ground. The second n channel DMOS transistor has a drain connected to the gate of the first n channel DMOS transistor and a source connected to the ground.
|
