发明名称 |
UV synthetic silica glass optical member and reduction projection exposure apparatus using the same |
摘要 |
This invention provides a synthetic silica glass optical member used together with light having a specific wavelength of 250 nm or less, in which the difference between the maximum value and the minimum value of transmittance [%/cm] per cm in thickness for the light in a predetermined direction within a plane perpendicular to the optical axis is 2.0%/cm or less.
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申请公布号 |
US6587262(B1) |
申请公布日期 |
2003.07.01 |
申请号 |
US20000686907 |
申请日期 |
2000.10.12 |
申请人 |
NIKON CORPORATION |
发明人 |
FUJIWARA SEISHI;KOMINE NORIO;JINBO HIROKI |
分类号 |
C03C3/06;C03C13/04;G03F7/20;(IPC1-7):G02B13/14 |
主分类号 |
C03C3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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