发明名称 Method and stencil for extruding material on a substrate
摘要 A stencil for use in fabricating semiconductor devices is disclosed that has an aperture having a first portion extending from a first side thereof and a second portion extending from a second side thereof to minimize the shear stress between the material extruded therethrough and the stencil. The stencil allows for material to be extruded through the top of the stencil to the surface of the substrate and not contact the wall of the second portion of the aperture of the stencil. Since the material only contacts a small area of the first portion of the aperture near the top of the stencil, the material remains on the substrate and not in the aperture of the stencil.
申请公布号 US6584897(B2) 申请公布日期 2003.07.01
申请号 US20020155654 申请日期 2002.05.23
申请人 MICRON TECHNOLOGY, INC. 发明人 COBBLEY CHAD;GRIGG FORD B.
分类号 B41F15/08;B41L13/00;B41M1/12;B41N1/24;H01L21/60;H05K3/12;H05K3/32;H05K3/34;(IPC1-7):B41N1/24 主分类号 B41F15/08
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