发明名称 Ferroelectric memory
摘要 A ferroelectric memory includes first and second plugs respectively connected to one and the other of source/drain regions of the transistor formed on a semiconductor wafer. A first capacitor electrode is connected to the first plug and located at a position above the transistor. The first capacitor electrode includes first and second capacitor faces on the second plug side and a side reverse thereto, respectively. A ferroelectric film is disposed on the first capacitor face. A second capacitor electrode is connected to the second plug and located at a position above the transistor. The second capacitor electrode is disposed on the first capacitor face through the ferroelectric film.
申请公布号 US6586793(B2) 申请公布日期 2003.07.01
申请号 US20010984518 申请日期 2001.10.30
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 IMAI KEITARO;YAMAKAWA KOJI
分类号 H01L27/105;H01L21/02;H01L21/8246;H01L27/115;H01L29/76;H01L29/94;(IPC1-7):H01L29/76 主分类号 H01L27/105
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