SELF-ALIGNED CONTACT ETCH WITH HIGH SENSITIVITY TO NITRIDE SHOULDER,申请号AU20020353145-传众专利搜索

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发明名称	SELF-ALIGNED CONTACT ETCH WITH HIGH SENSITIVITY TO NITRIDE SHOULDER
摘要
申请公布号	AU2002353145(A1)	申请公布日期	2003.06.30
申请号	AU20020353145	申请日期	2002.12.12
申请人	APPLIED MATERIALS, INC.	发明人	AJEY, M. JOSHI;PUI, MAN, AGNES NG;JAMES, A. STINNETT;USAMA DADU;JASON REGIS
分类号	H01L21/311;H01L21/60;(IPC1-7):H01L21/311	主分类号	H01L21/311
代理机构		代理人
主权项
地址

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