PLASMA FLUORINATION TREATMENT OF POROUS MATERIALS

摘要

An apparatus for fluorinating a substrate. The apparatus includes a vacuum chamber and a means for generating a fluorine-containing plasma throughout the entire chamber. The apparatus includes a capacitively-coupled system within the chamber that has at least one electrode powered by an RF source and at least one grounded electrode substantially parallel to the powered electrode. The electrodes are separated by about 25 mm or less.